Accurate Detection of Surface Defects in the Micro Range

Surface inspection and defect detection during manufacturing is a fundamental task for industrial image processing. Based on reliable and accurate defect detection systems changing process behaviour, like blunt tools, can be detected. In many areas like Si-wafer production, optical quality control is still state of the art. Nevertheless, in many cases a completely new and specialised image processing technique will be developed for every new problem. This contribution demonstrates a method for a general image processing technique for industrial surface inspection which is not limited to a specific hardware or defect type. The system is part of the Collaborative Research Center (CRC) 747 “Micro Cold Forming” and will be evaluated in a real cold forming process.