Due to the high costs of procuring new equipment and building new plants in the semiconductor industry, the increase in the productivity of the existing equipment and facilities becomes even more critical. Organizations today are looking to avoid any unnecessary investments into their equipment and facilities and maximizing the returns on their investments. The SEMI organization has released standard methods of measuring the performance of processes and systems with the analysis of OEE (Overall Equipment Efficiency) and RAM (Reliability, Availability, Maintainability). The introduction of Fab wide solutions, based on these methods, enables a continuous monitoring and improvement process of realizing potential savings and increasing the performance of these processes and sys-tems. The company AIS Automation has developed such a software solution and sells it as TFM (Total Fab Monitoring). This article describes the usage of the system where the application field is not limited only to the semiconductor in dustry.
